Process optimization of multicycle rapid thermal annealing of Mg-implanted GaN

To understand the capabilities and limitations of the multicycle rapid thermal annealing (MRTA) process, the key features of the process must be systematically explored. This work is dedicated to a study of the first step in the MRTA process — conventional annealing. A fundamental study was performed to determine the optimal conventional annealing temperature for the MRTA process by monitoring crystal quality and surface morphology. It was determined that both surface damage and crystal quality recovery must be considered when optimizing the MRTA process. Furthermore, the effect of performing the MRTA process with and without a preliminary conventional annealing step was investigated. It was determined that the conventional annealing step is a crucial part of the MRTA process.