Comb-drive III-nitride micro mirror fabricated by fast atom beam etching

We report here the fabrication of comb drive III-nitride micro mirror on an III-nitride/silicon platform. Silicon substrate is first patterned from the backside and removed by deep reactive ion etching (DRIE). III-nitride microstructures are defined on freestanding III-nitride slab by backside alignment technique and generated by fast atom beam (FAB) etching. The fabricated comb-drive III-nitride micro mirrors can operate on high resistivity silicon substrate without introducing additional isolation layer. The optical rotation angles are experimentally characterized in the rotation experiments. This work opens the possibility for producing III-nitride optical micro-electro-mechanical-system (MEMS) devices on an III-nitride/silicon platform.