WO3 nanorods on Si by anodising A1/W/Ti laers

In this paper we show a method based on electrochemistry to obtain tungsten oxide nanorods on the surface of a silicon substrate. The technique implies the anodisation of an aluminium/ tungsten bilayer and the selective etching of porous alumina. The resulting nanostructured metal oxide films show a very high surface to volume ratio, which is of interest in a wide range of applications including gas and bio sensors or as special coatings in medical applications.