Three-dimensional Nanomechanical Device Fabrication by FIB-CVD

Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga
⁺
FIB-CVD using a phenanthrene (C
₁₄
H
₁₀
) source as a precursor. The characterization of deposited film on a silicon substrate was performed by a transmission microscope and Raman spectra. This result indicates that the deposition film is a diamondlike amorphous carbon (DLC) which have attractive attention because of their hardness, chemical inertness and optical transparency. A large Young's modulus that exceeds 600 GPa seems to present great possibilities for various applications. These results demonstrate that FIB-CVD is one of key technologies to make 3D nanostructure devices in the field of electronics, mechanics, optics and biology.