Optimizing History Effects in 65nm PD-SOI CMOS

History effects in 65-nm partially-depleted silicon-on-insulator CMOS technology are systematically measured and characterized. The impact of various process adjustments on these effects is analyzed, and an optimization strategy is presented. Hardware data show >9% history effect changes is controllable with no loss of performance (e.g. speed and leakage), offering more flexibility in SOI circuit designs