Pseudospark produced pulsed electron beam for material processing

An intense pulsed electron beam produced by a pseudospark discharge is used for material processing. The electron beam propagates in a self-focused manner in the background gas. Hardly 12 ns after the beginning of the discharge the fraction of space charge neutralization is about 96%. To sustain the neutralization effect high energy electrons (E <500 keV) are accelerated in radial direction at the beam head, due to strong electric field gradients. At current maximum the beam pinches due to its own magnetic field. At peak current of 400 A and charging voltage up to 16 kV power density reaches 10/sup 9/ W/cm/sup 2/ on the target surface. Some results of copper thin films are presented. Due to the high expansion velocity of 10/sup 4/ m/s of the ablated target material a copper-matrix has been masked.<
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