Near-zero magnetostriction NiFe films deposited by ion beam sputtering

Near-zero magnetostriction permalloy films, 3000Å thick, were made by ion beam sputtering with a Ni
80
Fe
20
target. The placing of a Ni strip onto the target and N
2
addition were used to independently adjust the film composition and crystalline texture respectively. Film composition and crystalline texture were investigated using X-ray fluorescence and diffraction. A change of the magnetostriction constant λ expressed in terms of ΔH
k
, obtained by straining the film, was also observed after a 250°C easy axis annealing in a vacuum oven. We suggest that this change may be related to an observed change in microstructure of the NiFe for low and a reduction of the I
200
/I
111
X-ray peak intensity ratio for high N
2
partial pressures.