Simulation of MEMS Microfabrication Process Based on Narrow Band Level Set and Ray Tracing Methods

To improve the efficiency of MEMS device design and development, a MEMS process simulation program has been developed. In this paper, an evolutionary algorithm for surface contours, narrow band level set method, is introduced. The surface rate of the machined material is calculated by the process physics model and the ray tracing method. The surface rate and evolution algorithm are coupled to simulate the morphology evolution of the process. The simulation program is written in C++ language, and the most time-consuming part of the program is accelerated in parallel.