Formation of Transparent Contacts to p-NiO by DC Magnetron Sputtering ITO

This paper investigates the optical and electrical properties of ITO films for their application as a transparent contact electrode to NiO films. The films were fabricated by magnetron sputtering at various parameters of the discharge power and oxygen content in the working gas mixture. Structural analysis showed an increase in the crystallinity of the films during their subsequent annealing. The films demonstrate high conductivity and transparency with an absorption edge higher than that of NiO films. The results of the study show a high potential for using ITO films to create a transparent electrode to NiO layers.