Modification of Magnetic Semiconductors by Phosphorus Doping

Impact of P and Mn incorporation into G
$a$
As layers on their electronic and band structures as well as magnetic and structural properties has been studied. A set of the homogenous (Ga,Mn)(P,As) layers with 8% of Mn and 0-27% of P contents of high structural perfection have been grown by low-temperature molecular-beam epitaxy. Embedding P ions into the GaAs crystal lattice leads to an increase in the band gap, while Mn impurities lead to its decrease. A significant impact of Mn interstitial impurities on the structural and magnetic properties of the films was observed. We observe an enhancement of charge density in the presence of Mn. Higher energy interband transitions involving energy band structure that includes the split-off valence band and the L-point bands remained nearly unchanged.