Fabrication of Cu-doping Micro-Nano Grooved Structures on Ti6Al4V Alloy by Laser Direct Writing

In this paper, the micro-nano grooved structures with a period of 70um were prepared on the surface of Ti6A14V allowy by fiber laser direct writing technology, and Cu was doped on the grooves by ion sputtering and annealing processes. The effects of laser power and scanning speed on the topography and feature size of grooved structures on Ti6A14V allowy surface were studied. The topography was characterized by scanning electron microscopy (SEM). The results showed that the micro-nano grooved structures were formed when the laser power was 12W and the scanning speed was 10mm/s. The effect of Cu doping on micro-nano grooved structures was studied by adjusting the Cu doping from 1% to 50.7% by ion sputtering. The results of elemental analysis (EDS) showed that the nanostructures were generated on the micro grooved structures when the Cu-doped content was 19.1%.