Various Applications-Based Optimized DBR Structure With Effect of Different Material Systems

In this paper, four different material systems are explored and optimized to design a Distributed Bragg Reflector (DBR) structure. The detailed structural analysis is carried out using COMSOL Multiphysics software. The refractive index of DBR layers influences the intensity of the electric field of the device. As the high refractive index varies from 1.8, 2.2, 2.5 & 2.7, the change in the electric field intensity at the output port of the device has been observed. At 632.8 nm central wavelength, material systems as [glass |(SiO
₂
/SiN
₄
)
^m
| analyte], [glass |(SiO
₂
/Si
₃
N
₄
)
^m
| analyte], [glass |(SiO
₂
/TiO
₂
(Amorphous))
^m
| analyte] & [glass |(SiO
₂
/TiO
₂
(Rutile))
^m
| analyte] transmitted the 50%, 88%, 93% & 95% electric field at the output port of structure. With an increase in the value of the material system refractive index (RI), the value of electric fields increases at a specific refractive index of the analyte. Hence, these types of device structures are being used in a variety of optoelectronic applications. Therefore, the results pave the way for the investigation of the interdependency of structural analysis, electric field profile, reflectance, and transmittance under varying material systems.