Synthesis of Vanadium Dioxide by Pulsed Laser Deposition using a One-Step Process

Herein, the PLD growth of vanadium oxide at low oxygen pressure (e.g. ~ 10 mTorr) by using different substrate temperatures is discussed. The surface morphology was investigated by atomic force microscopy (AFM), showing a significant increase of the grain size with the modification the substrate temperature. The X-ray diffraction investigations evidenced the increase of the crystalline domain size from 10 nm to 22 nm, which is further ascribed to the different band gap energy.