Thin Film Spectral Measurement System Developed Based on Micro Spectrometer

Thin film technology has wide applications in several fields such as semiconductor manufacturing, biochemical sensors, solar cells and more. However, the instruments used to detect the properties of thin films remain bulky and expensive. In this study, we use a micro spectrometer fabricated using MEMS (Micro-Electro-Mechanical Systems) technology to design a system for thin film spectral measurements. The performance of this measurement system is validated using a quantum dot film. We also measured the interference spectrum of the quantum dot film in a sealed gas chamber environment. A reaction between the film and water vapor was observed, where the adsorption of water vapor by the film resulted in a shift of the interference spectral peak towards a longer wavelength. Regression analysis revealed a strong correlation (R
²
>0.95) between the wavelength shift of the peak and the relative humidity within the gas chamber.