Fano Resonance from Air-mode Photonic Crystal Nanobeam Cavity with 248-nm DUV Lithography

Photonic crystal nanobeam cavity (PCNC) is important building block for large-scale photonic integrated circuits (PICs). Nevertheless, most state-of-the-art demonstrations rely on electron beam lithography (EBL). Here, we experimentally present the characteristics of Fano resonance from air-mode PCNC using 248-nm deep ultraviolet (DUV) lithography for the first time. Experimentally high average Q factor of $\sim 1.58 \times 10^{4}$ is achieved.