Pneumatic Actioned Mechanism for Substrate Loading, Clamping and Unloading System in a Vacuum Sputtering Equipment

The paper presents automating a clamping mechanism for a vacuum magnetron sputtering equipment and integrating it in the existing pneumatic control system. The clamping mechanism is a vital part of the whole magnetron sputtering deposition system, as it takes the substrate from the load-lock fork and puts it in place, aligned with the target, for the deposition process. After deposition, it puts it back on the fork of the load-lock in order to extract it from the equipment. By automating the procedures, we ensure that no accidents happen and that the substrate will always be in the correct position