Transient Thermal and Electrical Co-Optimization of BEOL Top-Gated ALD In₂O₃ FETs on Various Thermally Conductive Substrates Including Diamond

In this work, we co-optimize the transient thermal and electrical characteristics of top-gated (TG), ultrathin, atomic-layer-deposited (ALD), back-end-of-line (BEOL) compatible indium oxide (In
2
O
3
) transistors on various thermally conductive substrates by visualization of the self-heating effect (SHE) utilizing an ultrafast high-resolution (HR) thermo-reflectance (TR) imaging system and overcome the thermal challenges through substrate thermal management and short-pulse measurement. At the steady-state, the temperature increase $(\Delta \mathrm{T})$ of the devices on highly resistive silicon (HR Si) and diamond substrates are roughly 6 and 13 times lower than that on SiO $_{2} /$Si substrate, due to the higher thermal conductivities $(\kappa) $ of HR Si and diamond. Consequently, ultrahigh drain current (I
D
) of 3.7 mA$/ \mu \mathrm{m}$ at drain voltage (V
DS
) of 1.4 V with direct current (DC) measurement is achieved with TG ALD In
2
O
3
FETs on diamond substrate. Furthermore, transient thermal study shows that it takes roughly 350 and 300 ns for the devices to heat-up and cool-down to the steady-states, being independent on the substrate. The extracted time constants of heat-up $(\tau_{h})$ and cool-down $(\tau_{c})$ processes are 137 and 109 ns, respectively. By employing electrical short-pulse measurement with pulse width (t
pulse
) shorter than $\tau_{h}$, the SHE can be significantly reduced. Accordingly, a higher I
D
of 4.3 mA$/ \mu \mathrm{m}$ is realized with a 1.9nm-thick In
2
O
3
FET on HR Si substrate after co-optimization.