Fabrication of Surface Grid by Method Interferential LCVD Nanolithography

The two- and multi-rays interferential lithography, in comparison with projection photolithography, is an alternative for creation periodical nanoscale 1D and 2D topological structures because it does not use photomasks and may have higher resolution. The results of investigation of processes of creation periodical surface topological patterns by interferential LCVD nanolithography technique was shown in this work. This technique allowed breaking diffraction limit and demonstrated process productivity increase for manufacturing submicron periodic structures with one stage character of the process and instantaneous exposure of big square surface of the wafer. During the experiments the deposition was carried out within few minutes on the back side of the vacuum chamber window. As a result of the experiment, a film with metallic luster and square 1 cm
²
was formed on the glass, showing optical diffraction effects in the light reflected at an angle. The relief of the surface measured by AFM showed that the average height of the structures is about 30 nm, the distance between the tops of the structures is 200 nm, and the width of a single structure is 100 nm at half the height.