Toshitaka Miyata - IEEE Xplore Author Profile
Skip to Main Content
IEEE.org
IEEE
Xplore
IEEE SA
IEEE Spectrum
More Sites
Subscribe
Donate
Personal Sign In
Browse
My Settings
Help
Institutional Sign In
Institutional Sign In
All
Books
Conferences
Courses
Journals & Magazines
Standards
Authors
Citations
ADVANCED SEARCH
Author details
< Back
Toshitaka Miyata
Also published under:
T. Miyata
Publications
4
Citations
5
Publications by Year
2009
2016
Co-Authors:
K. Adachi
M. Goto
A. Hidaka
S. Hirooka
A. Hokazono
Show All Co-Authors (24)
Follow
Manage Profile
Toshitaka Miyata
Also published under:
T. Miyata
Affiliation
Toshiba Corporation Center for semiconductor R&D
Semiconductor & Storage Products Company
Kawasaki, Japan
Publication Topics
Double-gate,
Gate Length,
Gate Oxide,
Source Side,
Gate Electrode,
65-nm CMOS,
Channel Length,
Extraction Parameters,
Extraction Procedure,
Gate Capacitance,
Gate Stack,
Integration Scheme
Show More
Publications
4
Citations
5
Publications by Year
2009
2016
Co-Authors:
K. Adachi
M. Goto
A. Hidaka
S. Hirooka
A. Hokazono
Show All Co-Authors (24)
Author's Published Works
Getting results...
Results
