Catalytic Chemical Vapor Deposition for Crystalline Silicon Solar Cells

Catalutic chemical vapor deposition (Cat -CVD) is a thin-film deposition method using radicals formed by the decomposition of source gas molecules on a heated catalyzing wire. Cat-CVD can form thin films with no plasma-induced damages, which leads to the formation of high-quality passivation films for crystalline silicon (c-Si) solar cells. In addition to the film deposition, Cat -CVD system can also be utilized for radical treatment to form doping layers or to terminate Si dangling bonds. In this paper, the fundamentals ofCat-CVD and the examples of its application to c-Si solar cells are reviewed.