Low-Frequency Noise after Temperature Treatment in Carbon-Based Thick-Film Resistor

The interest in the work is caused by the insufficient volume of research on the connection between the stability of resistive films, under external electrical and non-electrical influence, with the measurement of the magnitude of low-frequency noise. This article analyses experimental data on the low frequency noise of thick film resistors before and after temperature treatment at 50 and 100 for 68 hours. For the study, a test bench was based on an OP27 low-noise operational amplifier. The measured $1 / \mathbf{f}$ noise spectra after treatment show the changes in the magnitude of noise density in thick film carbon-based resistive films with temperature treatment. We recorded a $\mathbf{2 . 5 \%}$ increase in the low-frequency noise in the frequency range of $0.01-1 \mathrm{kHz}$. At the same time we recorded a decrease in resistance. From the technological and scientific point of view, an important result has been obtained, which in the future can be used to assess reliability in the study of the structures of solid-state electronic devices.