I. Introduction
To maximize the benefit of Circuit Integration, 3D ICs and their microscale Through-Silicon Vias (TSVs) were introduced as a new inter-die connection. Even though they suffer from both area and electrical coupling overhead, they are a key technological advancement for die connectivity. Testing is of paramount importance when it comes to TSVs, as their high integration density, and their manufacturing process, make them especially vulnerable to various defects. Therefore, effective defect screening and quality assurance are not only necessary but also a prerequisite for 3D ICs.