Tunable Graphene-Silicon-Silicon Oxide Optical Absorber Optimization for Optical-Wireless Communication and Sensor Applications

Tunable Graphene-Silicon-Silicon Oxide optical absorber is designed and optimized. It is designed as 3-layer of Graphene-Silicon-Silicon Oxide, and arranged in several stacks. The thickness of Graphene, Silicon, and Silicon Oxide are respectively 0.345 nm, 50 nm and 25 nm. The optimum absorbance is obtained in the 9 stacks arrangement with the operating wavelength of 5.8 $\mu \mathrm{m}$ and high absorbance wavelength range of 0.5 $\mu \mathrm{m}$. optimization were conducted on important design parameters namely Fermi level, number of stack layer, and material layer thickness.