Microspherical lithography for selective epitaxy

The effect of focusing with microspheric lenses during the photolithography process is recently studied intensively due to the wide range of applications of this method. This paper presents the results of nanostructuring the silicon surface using photolithography on the hexagonal array of microspheric lenses and etching silicon in nanoholes. The possibility of epitaxial selective synthesis of semiconductor nanostructures A3B5 on silicon is demonstrated.