Microstructure and optical properties of etched silicon layers for photovoltaic applications

Improving performance of photovoltaic devices requires the suppression of light reflectance. For these purposes we produced porous silicon layers by anodic etching method. Properties of formed structures are determined by applied technological operations and strongly influence its optical properties. The surface microstructure was studied by the atomic force microscopy. We analyzed microstructural properties by statistical and multifractal method. Obtained results provide reliable information about the development of microstructure properties and their relation to the optical properties.