Study of Magnetic Field Distribution in an Indigenous DC Magnetron Sputtering Setup

Magnetron sputtering is a very useful technique for various metallic and non-metallic thin film development. Due to its uniform deposition and high deposition rate, researchers found an interest in this deposition technique. The magnetic field distribution is the main key factor in magnetron sputtering deposition. In this work, a simulation study of magnetic field distribution of an indigenously designed and developed DC magnetron sputter-head has been carried out using Magneto-static solver program in CST Studio software. The obtained field variation plot along the diameter from simulation study has been compared with the physical magnetic field mapping experiment.