Atomic Diffusion Bonding using Y2O3 and ZrO2 films

We demonstrated atomic diffusion bonding (ADB) of wafers at room temperature using Y
2
O
3
and ZrO
2
films. Results showed that bonded interface disappeared perfectly (Y
2
O
3
films) or partially (ZrO
2
film) at room temperature, implying high bonding potential using these oxide films in ADB.