TCAD for logic technology process development

Process and device simulation has been invaluable for logic technology development for many technology nodes. The main goal of this work will be to review the broad and diverse simulation hierarchy that is used in industry to understand and optimize both current and future device technology options. This hierarchy spans both continuum modeling and atomistic methods / beyond continuum tools. Current process and device simulation results will be presented along possible extensions to the hierarchy to improve TCAD’s ability to help technology development.