Super-Hydrophobic Film Deposition on Epoxy Resin by Nanosecond Pulse Excited Ar/Hmdso Jet Array

Epoxy resin is widely used in insulating mediums in power system for their excellent electrical and mechanical properties. The improvement of the surface hydrophobicity of epoxy resin is key important to further enhance the insulating performance of epoxy resin. In this paper, the super-hydrophobic film is deposited on the surface of epoxy resin by a one dimensional Ar jet array driven by nanosecond pulse with hexamethyldisiloxane (HMDSO) addition. The influences of the plasma treatment time and the HMDSO content ratio on discharge characteristic and surface hydrophobicity of the deposited film are investigated by electrical and optical diagnoses, and surface physical and chemical measurements. With the optimized experimental conditions (60 s plasma treatment with 0.04 % HMDSO), the surface of the treated epoxy is found to be covered with dense coral like nano-particles with the scanning electron microscope (SEM) measurement. The Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS) analyze the chemical changes of the surface of epoxy resin. And it is found that the original C=O, C-H and other organic functional groups were replaced by Si-O-Si, Si-(CH 3 ) and other Silicon-containing functional groups and the element ratio of Si was increased from 0.4% to 28.0%. The water contact angle increased from 60.3° of the untreated surface to 150.0° after plasma treated.