Nanolithography to Beat the Diffraction Limit Using Ultrafast Laser

Nanolithography plays an important role in achieving micro-nanostructures and devices in various fields, such as semiconductor, information technology, nanophotonics and optical engineering. Breaking the diffraction limit is of great significance to achieve high resolution. The nonlinear optical effect provides an effective way to overcome the optical diffraction limit. In this study, the principle and the methodology of the nanolithography beating the optical diffraction limit based on the nonlinear effect using the ultrafast laser will be addressed.