Surface Modification to Improve the Electrochemical Performance of Neural Microelectrode Arrays

In this work, two different methods are used to modify the surface of the electrode sites in order to improve the electrochemical performance of the microelectrodes. One is sputtering gold under low vacuum conditions which presents a low impedance of
$286.1\mathrm{K}\Omega$
(72.9% reduction), and the other is electrochemical deposition of gold which reduces the impedance to
$157\mathrm{K}\Omega$
(85.1 % reduction). The two methods have different characteristics and both have effectively improve the performance of the electrode.