Rapid Thickness Identification Methodology For Two-Dimensional MoS2 and In2 Se3 Nanosheets Using Optical Microscopy

Problem StatementCurrently, identification methods for the thickness measurement of nanomaterials demand expensive and nonstandard equipment, impairing its continued study, practical applications, and industrial commercialization.The development of a novel and accurate thickness identification methodology is imperative for the continued study and potential commercialization of two-dimensional (2D) materials. Through experimentation, an effective and straightforward methodology has been produced for the thickness identification of MoS
2
and In
2
Se
3
nanosheets on 300nm Si/SiO
2
under optical microscopy from approximately single to decuple layer numbers. The optical contrast difference values of the atomically-thin nanostructures were collected throughout and arranged into a standard reference index which was correlated to height number in nanometers. Using this method, the thickness of a substance could be simply and accurately determined without the use of complex instrumentation, experimental setup, and calculation, therefore, saving time and financial costs.