Optimized UV Nanoimprinting Processes for Fabrication of High Fidelity Patterns

UV Nanoimprint Lithography as a flexible and lowcost nonconventional lithographic method has been investigated with focus on resolution, shape and substrate size. Resolution in the range of 12.5 nm and up to several micrometers line width and space has been demonstrated. Flexibility in terms of pattern shape has been shown with gratings, pillars, wells, barrel lenses and honeycomb structures. The pattern fidelity using the same working stamp for up to 50 imprints has been investigated for pillar and grating structures, showing repeatable results and proving a durable polymer mold. Finally it has been shown the UV NIL technique described can be used for wafer sizes up to 300 mm diameter, which is the preferred wafer size. The application of this process to even larger substrates has been demonstrated with a successful imprint on panel size. The results shown here for UV NIL using polymer molds can be used for a for various photonic and bio-medical applications.