Potassium Titanyl Phosphate Sputtering Features by Argon Cluster Ions

In this paper, we consider features of changes in surface morphology of potassium titanyl phosphate single crystal at the treatment of the argon cluster ion beam. It demonstrated that the sputtering process of the target surface at the small energy per atom in the cluster leads to a subnanometer level of the surface roughness. The sputtering yields and etching rates of potassium titanyl phosphate have been determined for small energy per atom in the argon cluster. We analyze the complex characteristic of surface quality is the power spectral density function of surface roughness for studying the surface smoothing effect of KTP single crystals by argon cluster ions.