3D Nanowire Arrays by Nanoimprint lithography and Mechanical Buckling

Metallic nanowires (NWs) are widely utilized in microelectronics, optics, biosensors and wearables. In many of these applications, there is a need for 3D curved and folded arrays. However, cost-effective nanomanufacturing of such arrays is challenging. Here, we describe a fabrication methodology that leverages high throughput nanoimprint lithography (NIL), photolithography, selective bonding and transfer printing on flexible elastomers. We demonstrate large area fabrication of uniformly and periodically buckled arrays composed of 60 x 350 nm NWs. We anticipate that this methodology could be utilized to create complex 3D NW arrays of broad relevance to wearables, nanoengineering, and nanomedicine.