Enhancement of FIB Fault Isolation Analysis using Plasma Cleaning

Electron beam-induced contamination is one of the annoying problems in scanning electron microscopy (SEM) inspection process. When electron beam continuously scans the specimen surface, hydrocarbon molecules (from vacuum pump) in the chamber or on the specimen surface are broken down and adhered to the specimen. This may alter or hidden away the structure of smaller feature in interest and causes it to be invisible. An effective way to confront with this contamination is using plasma cleaner to remove this undesirable residual.