Chemical Solution Deposition of MTiO3(M = Ca, Sr, and Ba) Based Buffer Layer Prior to Coated Conductors Architectures

Chemical solution deposition (CSD) approach was introduced in this work to simplify and to optimize the trifluoracetic based
M
TiO
₃
(
M
TO,
M
= Ca, Sr, and Ba) precursor solution, leading to the high shelf-life and the purity. Growing these
M
TO solutions on (100) LaAlO
₃
single-crystal substrates yields (h00) oriented and dense
M
TO buffer layers. Whereas it is clear that the roughness of
M
TO films and the lattice mismatch between
M
TO buffer layer and superconducting YBa
₂
Cu
₃
O
_7-δ
film is crucial for the film formation.