A novel approach for optimized design of RF MEMS capacitive switch

This paper presents an optimized design of Radio Frequency (RF) Micro-Electro-Mechanical System (MEMS) capacitive switch. The optimized design of proposed switch include utilization of three fabrication steps of lithography which helps in effectively reducing the cost of fabrication and the mechanical modeling of switch has Nano-scaled dimensions which again is beneficial in obtaining scaled device and thus increasing the yield per wafer. Silicon substrate platform is chosen as it proves to be advantageous if needed to be integrated with other semiconductor devices. Electrostatic actuation is used for the displacement of the metal membrane which is suspended upon the fixed anchors, and it helps in developing the capacitive contact. This actuation helps in the switching operation of RF MEMS switch and thus allowing and suppressing the RF signal flow.