Fabrication of silicon-core waveguide on bulk Si substrate with mold-assisted method and KrF Excimer laser reformation

The work is to fabricate a CMOS-compatible low-loss Si waveguide structures by KrF Excimer laser reformation system. It also solves the on-chip integration issues between electronics and photonics, as well as reduces the propagation loss for on-chip optical interconnect applications. By applying the mold-assisted method, the propagation loss can be reduced to 2±0.2dB/cm.