Distribution of Phosphorus in n-Type Multicrystalline Silicon Produced by Directional Solidification

n-type multicrystalline silicon ingot with a doping element of phosphorus was produced by directional solidification under industrial conditions. The evaporation and distribution of phosphorus were studied by content analysis in different positions. The results show that it is mainly controlled by melting and solidification processes. During the melting process, the content of phosphorus reduced from 16.6 and 6.7 ppmw to 11.1 and 6.0 ppmw under different melting times, respectively. The evaporation of phosphorus is mainly affected by the temperature. During the solidification process, the segregation of phosphorus was promoted by evaporation. A formula similar to the Scheil equation was established to calculate the longitudinal distribution of phosphorus in silicon. The results show that its longitudinal distribution is influenced by the evaporation coefficient, the solidification rate, and the temperature gradient. The effective segregation coefficient of phosphorus in ingots a and b was 0.31 and 0.33, respectively, which could be obtained from the fitting result. During the whole process, the phosphorus removal efficiency in ingots a and b was 60.8% and 50.5%, respectively. Its horizontal distribution is related to the morphology of the solid-liquid interface.