EOE Evolution Processes of Same Step Profile With Different One-Material Polishing Time in CMP

Edge over Erosion (EOE) is frequently observed in chemical mechanical polishing (CMP) process. It is found in the simulation results that the initial profile of two-material polishing stage has a great effect on the evolution of EOE. In this paper, five initial profiles of F1~F5 are obtained by using different one-material polishing time with same step profile. The evolution processes of the initial profiles of F1~F5 with selectivity ratio
$A$
are simulated and the EOE are given. The relationship between the initial profiles and the EOE evolution processes is investigated.