Investigating Machine Learning Applications for FDSOI MOS-Based Computer-Aided Design

As increasing demand for new applications requires increased demand for integrated chips (ICs), as well as due to miniaturization, the transistor count on a single chip increase to a billion. This produces a lot of data and information during the IC design process, due to which time consumption in the IC design process increases. So, we required technological advancement in this process to speed it up. These all-increase interest in machine learning (ML) in computer-aided design (CAD) tools and processes. This paper provided basic knowledge of ML, its broad application domain in FDSOI, and its use in IC design processes like physical design, mask synthesis, physical verification, lithography, etc.