Development of resistors with TaxNy deposited by RF sputtering using lithography technique

In this work, a Ta
x
N
y
thin film was used to manufacture resistors. The film was deposited by RF sputtering on an 96% polished alumina substrate, and it has a thickness, sheet resistance and resistivity of 150 nm, 181.63 Ω/sq and 2.72 mΩcm, respectively. Here, two types of resistor configurations were developed. The first one, is a set of resistors composed of five resistors with fixed length (L) and varying width (W) values. The second one is a set with TLM (Transfer Length Method) type configuration, which consists of six resistors in series with a fixed width (W) value and varying length (L) values. Both resistor configurations, shown a dependence almost linear with the resistance and a reproductive behavior, which allows uniformity in the manufacturing process. This study show that it is possible to use Ta
x
N
y
films to manufacture resistors that permit you to tune the resistance values according to the needs of your application, for example in Multi-chip module (MCM).