Thermophoretic Efficiency in the MCVD Process: A CFD Modeling

The thermophoretic efficiency in the modified chemical vapour deposition (MCVD) process has been numerically determined under specified conditions of temperature and velocity field in the silica deposition tube. A CFD code was used to solve a steady-state numerical model of the MCVD process. The cumulative efficiency of
$\text{SiO}_{2}$
and
$\text{GeO}_{2}$
deposition was calculated along the tube length, yielding to a maximum value of 42% and 37 % respectivelly.