A new measurement method for secondary electron yield based on SEM platform

The paper proposed a new secondary electron yield measurement method based on a scanning electron microscope platform. The incident electron beam from the scan electron gun of the SEM is focused and then entirely collected by a Faraday cup matched to the SEM platform. The incident current flowing through the Faraday cup can be measured by the existing current measurement unit in the SEM platform. Then the sample is bombarded with the electron beam with the same electron gun controlling parameters and the current is read directly again using the SEM current measurement unit. The secondary electron yield can be obtained by subtracting the difference between the Faraday cup current and the sample current and dividing it by the Faraday cup current. Compared with experimental data on the secondary electron emission experimental platform existing in the laboratory, the results confirm the validity of the proposed method.