Improved Laser Microprocessing of 2D Planar Microstrip Slow-Wave Structures for Millimeter-Band Vacuum Microelectronic Devices

For vacuum microelectronic devices operating at sub- THz frequencies, tiny slow-wave structures must be produced using high-precision microfabrication technologies. Nowadays, a variety of high-tech technologies, including UV-LIGA, deep reactive ion etching, 3D printing, nano-CNC milling, and laser micromachining, are used to fabricate microsized electromagnetic structures with micron and sub-micron accuracy. In this paper, we present an enhancement of our previously developed method for microfabrication of the designed 2D planar microstrip slow-wave structures for V-band operation using magnetron sputtering and nanosecond laser micromachining. A detailed illustration of the improved laser-based micromachining approach is presented. We'll go into great depth about the outcomes of the morphological analyses of the microfabricated samples slow-wave structures.