Application of Island Thin Films for Microelectronics Devices

The paper provides information about island thin films of copper in order to assess the possibility of their introduction into the elements of microelectronics devices. The fields of application of island films are shown. The mechanisms of conductivity in island films of metals are considered. A method for controlling the growth of an island metal film by electrical conductivity is proposed. The modes of formation of an island copper film have been worked out and the technology of introducing an island film into a memristor as an active layer to ensure switching of the device has been proposed. A test sample with an island layer was obtained. The experimental sample was tested. There is a change in the resistance of the test sample from 3 kOhm to 100Ohm.