Design of near-infrared photoelectric thin film devices based on Macleod software

With the development of modern optics, the application of infrared optical system is increasing day by day, and more and more optical devices require the working band in the near infrared region, which makes the development of high-performance infrared transmittance film become an important part of optical research. In this paper, an antireflective film with transmittance higher than 99% at 400-800nm was designed on K9 glass by using the software of film system design. According to the theoretical basis of optical film, the reflectivity of antireflection film is obtained by analyzing the admittance function of antireflection film. Using TiO
2
as the coating material with high refractive index and SiO
2
as the coating material with low refractive index, the near-infrared antireflection film with T≥99% was designed, and the total thickness of the film layer was 1660.07nm. The design results meet the requirements of technical indicators.