High Transmittance Metasurface Holograms Using Silicon Nitride

A metasurface hologram with high transmittance of 93% was achieved by using silicon nitride (SiN) as a meta-atom material, which far surpasses the conventional record of 80% reported using TiO
2
meta-atom [1]. This progress is because of the decrease in the Fresnel reflection due to the effective index matching between the substrate and metasurface hologram. The projection of an image and a cinematographic movie were demonstrated with improved brightness and color reproducibility.