Microcrystalline Si and (Si,Ge) solar cells on plastic substrates

We report on the growth of microcrystalline Si and (Si,Ge) films and devices on polyimide substrates. The films and devices were grown using remote plasma CVD process using a remote, low pressure ECR reactor. The substrates were Mo coated polyimide. The devices were of the p-n-n+ type. The crystalline quality of the films was determined using Raman measurements. Novel buffer layers were used to increase the voltage in the device. The devices show excellent voltages, fill factors and quantum efficiency.